Compositions and antireflective coatings for photolithography

摘要

The invention provides a first composition comprising at least the following:
A) a Compound F1 selected from Formula 1:
wherein Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and
R1, R2, and R3 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl; and
B) a Compound F2 selected from Formula 2:
wherein Rb is selected from H or a saturated group comprising alkyl, alkylene, or alkylidene, and
R4, R5, and R6 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl; and
C) a Compound F3 selected from Formula 3:
wherein Rc comprises more than one multiple bond, and these multiple bonds are in a conjugated configuration; and
R7, R8, and R9 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl; and
D) A Compound F4 selected from Formula 4:
wherein R10, R11, R12, and R13 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl.