发明名称 Closed-loop process control for electron beam freeform fabrication and deposition processes
摘要 A closed-loop control method for an electron beam freeform fabrication (EBF3) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF3 process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF3 apparatus to control the EBF3 process in a closed-loop manner.
申请公布号 US8452073(B2) 申请公布日期 2013.05.28
申请号 US20100750991 申请日期 2010.03.31
申请人 TAMINGER KAREN M.;HAFLEY ROBERT A.;MARTIN RICHARD E.;HOFMEISTER WILLIAM H.;THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION 发明人 TAMINGER KAREN M.;HAFLEY ROBERT A.;MARTIN RICHARD E.;HOFMEISTER WILLIAM H.
分类号 G06K9/00 主分类号 G06K9/00
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