发明名称 Method of manufacturing retardation film
摘要 A method of manufacturing a retardation film includes: a first step of forming, on the same metal master, a main region having several kinds of groove regions having different extending directions of grooves, and a sub region having one kind of groove region having a predetermined extending direction of grooves or several kinds of groove regions having different extending directions of grooves; and a second step of collectively transferring reverse patterns of the main and sub regions on the metal master to a base, and then forming, on a surface of the base, a layer including an alignable material to be aligned in correspondence to irregularity of the surface of the base, thereby forming a patterned retardation region in a site having a reverse pattern of the main region, and forming an alignment mark region in a site having a reverse pattern of the sub region.
申请公布号 US8449797(B2) 申请公布日期 2013.05.28
申请号 US201113173133 申请日期 2011.06.30
申请人 SUZUKI SHINYA;HOSHI MITSUNARI;SONY CORPORATION 发明人 SUZUKI SHINYA;HOSHI MITSUNARI
分类号 B29D7/01;B29C33/40 主分类号 B29D7/01
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