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发明名称
POST Cu CHEMICAL MECHANICAL POLISHING CLEANING SOLUTION
摘要
<p>구리 화학적 기계적 연마 후 세정 공정용 세정액이 개시된다. 구리 화학적 기계적 연마 후 세정 공정용 세정액은 에틸렌디아민사초산, 5-아미노테트라졸 및 염기성 화합물로 이루어진 pH 조절제를 포함한다.</p>
申请公布号
KR101268346(B1)
申请公布日期
2013.05.28
申请号
KR20100135724
申请日期
2010.12.27
申请人
发明人
分类号
C11D7/32;C23G5/036
主分类号
C11D7/32
代理机构
代理人
主权项
地址
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