发明名称 Control device and control method of plasma processing system, and storage medium storing control program
摘要 In a control device of a plasma processing system, a communication unit is configured to receive processing information related to a carrier of a next processing lot. A determination unit is configured to determine whether the processing information received by the communication unit has pre-treatment information related to one of the plasma processing devices. When it is determined that the processing information has the pre-treatment information by the determination unit, a generation unit is configured to generate an object for declaring execution of the pre-treatment for the carrier of a next processing lot if a desired condition of transferring of the carrier is satisfied. In addition, if the object is generated by the generation unit, a process executing control unit is configured to start the pre-treatment for the target object in the carrier of a next processing lot without any notification that the carrier reaches a destination plasma processing device.
申请公布号 US8452455(B2) 申请公布日期 2013.05.28
申请号 US20090496117 申请日期 2009.07.01
申请人 MOCHIZUKI HIROAKI;NUMAKURA MASAHIRO;TOKYO ELECTRON LIMITED 发明人 MOCHIZUKI HIROAKI;NUMAKURA MASAHIRO
分类号 G05B24/04 主分类号 G05B24/04
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