发明名称 Plasma doping method and apparatus thereof
摘要 In a plasma torch unit, a conductor rod having a spiral shape is disposed inside a quartz pipe having a surface coated with boron glass, and a brass block is disposed on the periphery thereof. While a gas is being supplied into a cylindrical chamber, a high-frequency power is supplied to the conductor rod and a plasma is generated in the cylindrical chamber, so that a base material is irradiated with the plasma.
申请公布号 US8450819(B2) 申请公布日期 2013.05.28
申请号 US201113291186 申请日期 2011.11.08
申请人 OKUMURA TOMOHIRO;SAITOH MITSUO;NAKAYAMA ICHIRO;KITAOKA TARO;PANASONIC CORPORATION 发明人 OKUMURA TOMOHIRO;SAITOH MITSUO;NAKAYAMA ICHIRO;KITAOKA TARO
分类号 H01L27/14;H01L21/44 主分类号 H01L27/14
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