发明名称 Enforcement of semiconductor structure regularity for localized transistors and interconnect
摘要 A global placement grating (GPG) is defined for a chip level to include a set of parallel and evenly spaced virtual lines. At least one virtual line of the GPG is positioned to intersect each contact that interfaces with the chip level. A number of subgratings are defined. Each subgrating is a set of equally spaced virtual lines of the GPG that supports a common layout shape run length thereon. The layout for the chip level is partitioned into subgrating regions. Each subgrating region has any one of the defined subgratings allocated thereto. Layout shapes placed within a given subgrating region in the chip level are placed in accordance with the subgrating allocated to the given subgrating region. Non-standard layout shape spacings at subgrating region boundaries can be mitigated by layout shape stretching, layout shape insertion, and/or subresolution shape insertion, or can be allowed to exist in the final layout.
申请公布号 US8453094(B2) 申请公布日期 2013.05.28
申请号 US20090363705 申请日期 2009.01.30
申请人 KORNACHUK STEPHEN;MALI JIM;LAMBERT CAROLE;BECKER SCOTT T.;TELA INNOVATIONS, INC. 发明人 KORNACHUK STEPHEN;MALI JIM;LAMBERT CAROLE;BECKER SCOTT T.
分类号 G06F17/50 主分类号 G06F17/50
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