发明名称 Irradiation apparatus and manufacturing method for semiconductor device
摘要 Disclosed herein is an irradiation apparatus including: laser light source; a polarization splitting section configured to split laser light emitted from the laser light source into first linearly polarized light and second linearly polarized light different in polarization direction; a light beam dividing section configured to divide the first or second linearly polarized light into a plurality of light beams; a quarter-wave plate array composed of a plurality of first quarter-wave plates for converting some of the light beams into right circularly polarized light and a plurality of second quarter-wave plates for converting the other of the light beams into left circularly polarized light, the first quarter-wave plates and the second quarter-wave plates being alternately arranged in a first direction perpendicular to an optical axis; and a projection optical system for condensing the right circularly polarized light and the left circularly polarized light toward a work surface to be irradiated.
申请公布号 US8451536(B2) 申请公布日期 2013.05.28
申请号 US20100792327 申请日期 2010.06.02
申请人 TSUKIHARA KOICHI;SONY CORPORATION 发明人 TSUKIHARA KOICHI
分类号 G02B27/10 主分类号 G02B27/10
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