发明名称 |
POLYAMIDE RESIN COMPOSITION WITH EXCELLENT IMPACT RESISTANCE |
摘要 |
PURPOSE: A polyamide resin composition is provided to elaborately mold the composition due to low shrinking ability, to perform a convenient molding by excellent workability, and to have transparent aesthetic appearance and excellent antibacterial property. CONSTITUTION: A polyamide resin composition comprises: amorphous polyamide formed by condensation polymerization of octadecanoic acid and bis(3-methyl-4-aminocyclohexyl)methane; and 1-40 weight% of buffer based on the total weight of the composition. The buffer is selected from the group consisting of ethylene-butyl acrylate, ethylene propylene copolymer grafted with 5 weight% of glycidyl methacrylate copolymer and 0.5 weight% of maleic anhydride, ethylene octene copolymer grafted with 0.95 weigh% of maleic anhydride, and their mixture.
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申请公布号 |
KR101268189(B1) |
申请公布日期 |
2013.05.27 |
申请号 |
KR20120124976 |
申请日期 |
2012.11.06 |
申请人 |
KOREA ENGINEERING PLASTICS CO., LTD. |
发明人 |
KIM, TAK GYU;JEON, KWAN SOO;KWAK, HAN HO;CHAE, HONG WON |
分类号 |
C08L77/06;A61C13/00;C08L23/08;C08L23/26 |
主分类号 |
C08L77/06 |
代理机构 |
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地址 |
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