发明名称 POLYAMIDE RESIN COMPOSITION WITH EXCELLENT IMPACT RESISTANCE
摘要 PURPOSE: A polyamide resin composition is provided to elaborately mold the composition due to low shrinking ability, to perform a convenient molding by excellent workability, and to have transparent aesthetic appearance and excellent antibacterial property. CONSTITUTION: A polyamide resin composition comprises: amorphous polyamide formed by condensation polymerization of octadecanoic acid and bis(3-methyl-4-aminocyclohexyl)methane; and 1-40 weight% of buffer based on the total weight of the composition. The buffer is selected from the group consisting of ethylene-butyl acrylate, ethylene propylene copolymer grafted with 5 weight% of glycidyl methacrylate copolymer and 0.5 weight% of maleic anhydride, ethylene octene copolymer grafted with 0.95 weigh% of maleic anhydride, and their mixture.
申请公布号 KR101268189(B1) 申请公布日期 2013.05.27
申请号 KR20120124976 申请日期 2012.11.06
申请人 KOREA ENGINEERING PLASTICS CO., LTD. 发明人 KIM, TAK GYU;JEON, KWAN SOO;KWAK, HAN HO;CHAE, HONG WON
分类号 C08L77/06;A61C13/00;C08L23/08;C08L23/26 主分类号 C08L77/06
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