| 摘要 |
PURPOSE: A substrate processing apparatus is provided to simplify a structure by using an opening/closing unit which changes its own shape according to the inflow/outflow of air and closes/opens a process chamber. CONSTITUTION: A process chamber(100) provides a process space. The process chamber includes an opening part. An opening/closing part(350) includes an opening/closing unit(310) and a pump unit(350). The opening/closing unit contracts and expands according to the inflow/outflow of air. The pump unit controls the inflow/outflow of the air.
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