APPARATUS AND METHOD FOR PROCESSING SUBSTRATE INCLUDING EXHAUST PORTS

摘要

PURPOSE: An apparatus and a method for processing a substrate including exhaust ports are provided to prevent reaction gas from being deposited in a lower chamber by maintaining the high pressure of a mounting space which is higher than that of a process space. CONSTITUTION: At least one supply nozzle(332) has a supply hole for discharging reaction gas. At least one discharge nozzle(334) is arranged along the inner wall of the external reaction tube. The discharge nozzle has a discharge hole for sucking unreacted gas and by-products in the process space. A back exhaust line is connected to the discharge nozzle. The back exhaust line discharges the unreacted gas and the by-products from the discharge hole to the outside.