FINE-TUNEABLE SPUTTERING DEPOSITION SYSTEM AND METHOD

摘要

PURPOSE: A fine-controlled sputtering deposition system and a sputtering method using the same are provided to increase a mirror ratio by forming a magnetron magnetic field structure. CONSTITUTION: A target(200) is mounted in a plasma chamber. A power source applies bias voltage to the target. A microwave irradiation apparatus irradiates microwave into the plasma chamber. A first magnetic arrangement body(150) forms a bridge-type magnetic flux around the target. A second magnetic arrangement body(250) symmetrically faces the first magnetic arrangement body.