发明名称 METHOD OF PREPARING SUBSTRATE
摘要 PURPOSE: A method for manufacturing a substrate is provided to improve productivity by extending the use time of a polishing pad. CONSTITUTION: A polishing pad has a nap layer. The nap layer is contacted with the substrate. The nap layer has air gaps. The nap layer is made of base resin. The base resin includes ether resin, ester resin, and polycarbonate resin.
申请公布号 KR20130054179(A) 申请公布日期 2013.05.24
申请号 KR20120128496 申请日期 2012.11.14
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 MATSUI HARUNOBU;HARADA DAIJITSU;WATABE ATSUSHI;UEDA SHUHEI;TAKEUCHI MASAKI
分类号 H01L21/304;H01L21/02 主分类号 H01L21/304
代理机构 代理人
主权项
地址