发明名称 TUNNEL FET AND METHODS FOR FORMING THE SAME
摘要 <p>PURPOSE: A tunnel FET and a method for forming the same are provided to prevent leakage current by using a gate electrode, a source, and a drain region. CONSTITUTION: A source and a drain region(126) are formed with opposite conductive types. A channel region(122) is formed between the source and the drain region. A source diffusion barrier(128) is formed between the channel region and the source region. The source diffusion barrier and the source are overlapped with a gate electrode. The source diffusion barrier has a second band gap larger than a first band gap.</p>
申请公布号 KR20130054113(A) 申请公布日期 2013.05.24
申请号 KR20120039952 申请日期 2012.04.17
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 BHUWALKA KRISHNA KUMAR;DOORNBOS GERBEN;PASSLACK MATTHIAS
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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