发明名称 |
TUNNEL FET AND METHODS FOR FORMING THE SAME |
摘要 |
<p>PURPOSE: A tunnel FET and a method for forming the same are provided to prevent leakage current by using a gate electrode, a source, and a drain region. CONSTITUTION: A source and a drain region(126) are formed with opposite conductive types. A channel region(122) is formed between the source and the drain region. A source diffusion barrier(128) is formed between the channel region and the source region. The source diffusion barrier and the source are overlapped with a gate electrode. The source diffusion barrier has a second band gap larger than a first band gap.</p> |
申请公布号 |
KR20130054113(A) |
申请公布日期 |
2013.05.24 |
申请号 |
KR20120039952 |
申请日期 |
2012.04.17 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
BHUWALKA KRISHNA KUMAR;DOORNBOS GERBEN;PASSLACK MATTHIAS |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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