发明名称 PLASMA PROCESSING IN A CAPACITIVELY-COUPLED REACTOR WITH TRAPEZOIDAL WAVEFORM EXCITATION
摘要 The invention concerns a method for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.
申请公布号 KR20130054349(A) 申请公布日期 2013.05.24
申请号 KR20137003722 申请日期 2011.07.12
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE;ECOLE POLYTECHNIQUE 发明人 BOOTH JEAN PAUL;JOHNSON ERIK
分类号 H01J37/32 主分类号 H01J37/32
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