发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMING METHOD, AND PRINT CIRCUIT BOARD MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in sensitivity, resolution, and adhesion, and to provide a photosensitive element, a resist pattern forming method, and a print circuit board manufacturing method using the photosensitive resin composition. <P>SOLUTION: A photosensitive resin composition contains (A) binder polymer, (B) photopolymerizable compound, and (C) photopolymerization initiator. The (C) photopolymerization initiator contains a compound represented by a specific formula (1). <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013101296(A) 申请公布日期 2013.05.23
申请号 JP20110283988 申请日期 2011.12.26
申请人 HITACHI CHEMICAL CO LTD 发明人 MIYASAKA MASAHIRO;KAJI MAKOTO;YIN JIE;JIANG XUESONG;LI HO
分类号 G03F7/031;C07C251/66;C07D279/22;C07D279/28;C08F2/46;G03F7/004;G03F7/027;G03F7/033;H05K3/00;H05K3/06 主分类号 G03F7/031
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