发明名称 |
MANUFACTURING METHOD OF COLOR FILTER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a color filter using a gradation mask which can perform delicate adjustment of transmittance and is useful for forming three or more kinds of different members in a color filter. <P>SOLUTION: A manufacturing method of a color filter uses a gradation mask 11. The gradation mask comprises: a transparent substrate 12; a light shielding film 13 formed on the transparent substrate 12 in a pattern shape; and a semitransparent film 14 having a transmittance adjustment function. The gradation mask comprises: a transmission area 21 which has only the transparent substrate 12; a light shielding area 22 where a main pattern of the light shielding film 13 is provided on the transparent substrate 12; and a second semitransparent region 24 in which only an auxiliary pattern of the semitransparent film 14 is provided on the transparent substrate 12 and at least either one of the auxiliary pattern of the semitransparent film 14 and an opening has size of a resolution limit or below. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013101361(A) |
申请公布日期 |
2013.05.23 |
申请号 |
JP20120273740 |
申请日期 |
2012.12.14 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
KAWAGUCHI SHUJI;HINO KAZUYUKI;SUMINO TOMONOBU |
分类号 |
G03F1/00;G02B5/20;G03F1/54 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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