VACUUM EVAPORATION APPARATUS

摘要

Provided is a vacuum evaporation apparatus, wherein a film with a uniform thickness can be formed for a long period of time, without impeding detection of the film by evaporated vapor deposition material, irrespective of the vapor deposition material. The vacuum evaporation apparatus (1) is provided with: a vapor deposition material container (2); an evaporation means that evaporates vapor deposition material; a plurality of deposition rate monitors (3, 4) that observe the deposition rate at positions with different tilting angles; a deposition rate control unit that compares the deposition rate of one deposition rate monitor (3) with a predetermined setting value, and controls the output of the evaporation means such that the fluctuation in the observed deposition rate with respect to the setting value is within a prescribed range; a material supply unit (5); a vapor-amount distribution calculation unit that calculates distribution in the amount of vapor of the vapor deposition material evaporated by the evaporation means, using the deposition rates observed by the plurality of deposition rate monitors (3, 4); and a material supply control unit that compares the calculated vapor-amount distribution with a predetermined vapor-amount distribution setting value, and controls the amount of vapor deposition material to be supplied and the timing at which the vapor deposition material is to be supplied, such that fluctuation in the calculated vapor-amount distribution with respect to the vapor-amount distribution setting value is within a prescribed range.