METHOD FOR FORMING PATTERN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a pattern for obtaining excellent roughness performance, uniformity of a local pattern dimension and exposure latitude, and favorable dry etching durability in a pattern portion formed by development, and to provide an actinic ray-sensitive or radiation-sensitive resin composition to be used for the method.

SOLUTION: The method for forming a pattern includes steps of: forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition, which contains a resin containing a repeating unit (a1) having a group that is decomposed by acid to produce a carboxyl group, and a compound that generates acid by irradiation with actinic rays or radiation; exposing the film to light; and forming a negative pattern by developing the film by using a developing solution containing an organic solvent that includes a hetero atom and a carbon atom and has 7 or more carbon atoms. The repeating unit (a1) satisfies an expression of 0COPYRIGHT: (C)2013,JPO&INPIT