| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint composition for forming a formed inorganic thin film and a patterned inorganic thin film, wherein the composition is excellent in transferability of irregularity and prevents convex-concave pattern from giving way due to calcination. <P>SOLUTION: An imprint composition is used for forming an inorganic thin film by using a mold made of a resin, wherein the imprint composition comprises a metal oxide precursor and a resin. <P>COPYRIGHT: (C)2013,JPO&INPIT |
