METHOD AND APPARATUS COMPRISING A PLURALITY OF EXHAUST PORTS FOR TREATING SUBSTRATE

摘要

According to one embodiment of the present invention, an apparatus for treating a substrate through which the substrate is processed comprises: a lower chamber, the upper portion of which is open, and which is provided with a pathway on one side through which the substrate is entered and exited; an outer reaction tube, which closes the upper portion of the lower chamber that is open, for providing a processing space in which the process takes place; a substrate holder, on which at least one substrate is stacked in a vertical direction, and which can be switched between a loading position in which the substrate is stacked inside the substrate holder and a processing position in which the substrate is subjected to the process; one or more supply nozzles, which are disposed along the inner wall of the outer reaction tube and are provided with a supply port that discharges the reaction gas; one or more exhaust nozzles, which are disposed along the inner wall of the outer reaction tube and are provided with an exhaust port that aspirates non-reacted gas and a reaction by-product; and a rear exhaust line, which is connected to the exhaust nozzles, for discharging the non-reacted gas and the reaction by-product that are aspirated through the exhaust port, wherein the lower chamber is provided with an exhaust port for connecting the exhaust nozzles to the rear exhaust line, and an auxiliary exhaust port for connecting a loading space that is formed inside the lower chamber to the rear exhaust line.