发明名称 Method for producing titanium metal
摘要 Disclosed is a method for producing titanium metal, which comprises: (a) a step in which a mixed gas is formed by supplying titanium tetrachloride and magnesium into a mixing space that is held at an absolute pressure of 50-500 kPa and at a temperature not less than 1700˚C; (b) a step in which the mixed gas is introduced into a deposition space; (c) a step in which titanium metal is deposited and grown on a substrate for deposition; and (d) a step in which the mixed gas after the step (c) is discharged. In this connection, the deposition space has an absolute pressure of 50-500 kPa, the substrate for deposition is arranged in the deposition space, and at least a part of the substrate for deposition is held within the temperature range of 715-1500˚C.
申请公布号 AU2010252965(B2) 申请公布日期 2013.05.23
申请号 AU20100252965 申请日期 2010.05.28
申请人 HITACHI METALS, LTD.;TEKNA PLASMA SYSTEMS INC. 发明人 HAN, GANG;UESAKA, SHUJIROH;SHOJI, TATSUYA;ABE, MARIKO;BOULOS, MAHER I.;GUO, JIAYIN;JUREWICZ, JERZY
分类号 C22B34/12;C22B5/04 主分类号 C22B34/12
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