| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound, a resin, a resist composition and etc., with which a resist pattern with an excellent mask error factor is obtainable. <P>SOLUTION: A resist composition containing a compound represented by formula (I), a resin having a structural unit originating from the compound, and an acid generator is disclosed [wherein, each of R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>independently represents a 1-6C aliphatic hydrocarbon group, or R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>are bonded to each other and form a 5-20C ring together with carbon atoms to which they are bonded; R<SP POS="POST">4</SP>represents a group including an ethylenic double bond; W represents a 6-18C divalent alicyclic hydrocarbon group; T<SP POS="POST">1</SP>represents a single bond, a 1-6C divalent aliphatic hydrocarbon group, etc.; T<SP POS="POST">2</SP>represents a 1-6C divalent aliphatic hydrocarbon group, etc.]. <P>COPYRIGHT: (C)2013,JPO&INPIT |
