发明名称 |
RECOGNITION OF TEMPLATE PATTERNS WITH MASK INFORMATION |
摘要 |
Apparatus includes a machine readable storage medium for storing a template library having at least one template. The template is to include a first layout representation of at least one pattern to be formed by multi-patterning a single layer of an IC. The pattern has a plurality of portions to be formed using a plurality of respectively different photomasks. The first layout representation includes data identifying on which photomask each portion is to be located. An electronic design automation (EDA) tool includes a processor configured to receive a hardware description language representation of at least a part of a circuit and generate a second layout representation of the part of the circuit having a plurality of polygons. The EDA tool has a matching module that identifies and outputs an indication of whether one or more of the plurality of portions matches a subset of the plurality of polygons.
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申请公布号 |
US2013132913(A1) |
申请公布日期 |
2013.05.23 |
申请号 |
US201113303374 |
申请日期 |
2011.11.23 |
申请人 |
FU CHUNG-MIN;LU YUNG-FONG;YANG WEN-JU;HSU CHIN-CHANG;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
FU CHUNG-MIN;LU YUNG-FONG;YANG WEN-JU;HSU CHIN-CHANG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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