发明名称 |
DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS |
摘要 |
<p>Broadly speaking, the present invention fills these needs by providing a distributed multi-zone plasma source. It should be appreciated that the present invention can be implemented in numerous ways, including as a process, an apparatus, a system, computer readable media, or a device. Several inventive embodiments of the present invention are described below. One embodiment provides a processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. Multiple plasma chamber outlets can couple a plasma chamber of each one of the plasma sources to the process chamber.</p> |
申请公布号 |
WO2013074354(A1) |
申请公布日期 |
2013.05.23 |
申请号 |
WO2012US63987 |
申请日期 |
2012.11.07 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
SHAJII, ALI;GOTTSCHO, RICHARD;BENZERROUK, SOUHEIL;COWE, ANDREW;NAGARKATTI, SIDDHARTH, P.;ENTLEY, WILLIAM, R. |
分类号 |
H05H1/02 |
主分类号 |
H05H1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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