发明名称 DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS
摘要 <p>Broadly speaking, the present invention fills these needs by providing a distributed multi-zone plasma source. It should be appreciated that the present invention can be implemented in numerous ways, including as a process, an apparatus, a system, computer readable media, or a device. Several inventive embodiments of the present invention are described below. One embodiment provides a processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. Multiple plasma chamber outlets can couple a plasma chamber of each one of the plasma sources to the process chamber.</p>
申请公布号 WO2013074354(A1) 申请公布日期 2013.05.23
申请号 WO2012US63987 申请日期 2012.11.07
申请人 LAM RESEARCH CORPORATION 发明人 SHAJII, ALI;GOTTSCHO, RICHARD;BENZERROUK, SOUHEIL;COWE, ANDREW;NAGARKATTI, SIDDHARTH, P.;ENTLEY, WILLIAM, R.
分类号 H05H1/02 主分类号 H05H1/02
代理机构 代理人
主权项
地址