FILM DEPOSITION DEVICE AND FILM DEPOSITION METHOD

摘要

Disclosed are a film deposition device and a film deposition method. The film deposition device comprises a film deposition cavity, the film deposition cavity comprising: a cavity body casing, the cavity body casing forming the cavity body of the film deposition cavity; a target material support, disposed in a middle portion of the cavity body and used for placing a target material formed of a component A; a substrate stage, disposed in the middle portion of the cavity body and opposite to the target material support; a laser beam inlet, disposed on a side surface of the cavity body casing, diagonally opposite to the target material support, and used for inputting the laser beam to bombard the target material on the target material support to generate plasma plume; a beam source furnace interface, disposed on the side surface of the cavity body casing, diagonally opposite to the substrate stage, and used for inputting a molecular beam flow formed of a component B. The laser beam inlet and the beam source furnace interface input the laser beam and the molecular beam flow at the same time. The present invention can effectively avoid the mutual interference between the pulsed laser beam deposition film formation process and the molecular beam epitaxial film formation process, and can prepare films of better quality or films incapable of being prepared through the prior art.