发明名称 Imprinted Dielectric Structures
摘要 A method for manufacturing a photovoltaic device comprises the steps choosing a substrate with a conductive layer; depositing a non-conductive layer; imprinting a structure comprising features into the non-conductive layer; and depositing an active layer operable in the photovoltaic device; wherein the active layer is in electrical contact with the conductive layer through a feature in the imprinted layer.
申请公布号 US2013125983(A1) 申请公布日期 2013.05.23
申请号 US201113300046 申请日期 2011.11.18
申请人 WEISS DIRK N.;INTEGRATED PHOTOVOLTAIC, INC. 发明人 WEISS DIRK N.
分类号 H01L31/0232;H01L31/18 主分类号 H01L31/0232
代理机构 代理人
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