发明名称 |
Imprinted Dielectric Structures |
摘要 |
A method for manufacturing a photovoltaic device comprises the steps choosing a substrate with a conductive layer; depositing a non-conductive layer; imprinting a structure comprising features into the non-conductive layer; and depositing an active layer operable in the photovoltaic device; wherein the active layer is in electrical contact with the conductive layer through a feature in the imprinted layer.
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申请公布号 |
US2013125983(A1) |
申请公布日期 |
2013.05.23 |
申请号 |
US201113300046 |
申请日期 |
2011.11.18 |
申请人 |
WEISS DIRK N.;INTEGRATED PHOTOVOLTAIC, INC. |
发明人 |
WEISS DIRK N. |
分类号 |
H01L31/0232;H01L31/18 |
主分类号 |
H01L31/0232 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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