| 发明名称 |
METHOD FOR CLEANING PLATINUM RESIDUES ON A SEMICONDUCTOR SUBSTRATE |
| 摘要 |
A method for cleaning platinum residues from a surface of a substrate is provided. The method initiates with exposing the surface to a first solution containing a mixture of nitric acid and hydrochloric acid. Then, the surface is exposed to a second solution containing hydrochloric acid.
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| 申请公布号 |
US2013125923(A1) |
申请公布日期 |
2013.05.23 |
| 申请号 |
US201313738112 |
申请日期 |
2013.01.10 |
| 申请人 |
INTERMOLECULAR INC.;INTERMOLECULAR INC. |
发明人 |
DUONG ANH;BARSTOW SEAN;KARLSSON OLOV;LI BEI;MAVRINAC JAMES |
| 分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
| 代理机构 |
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代理人 |
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