发明名称 Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber
摘要 A guided wave applicator comprising two electrically conductive waveguide walls and a waveguide dielectric. The volume of the waveguide dielectric is composed of non-gaseous dielectric material and is positioned between the two waveguide walls. The waveguide dielectric includes first and second longitudinal ends and includes first, second, third and fourth sides extending longitudinally between the two longitudinal ends. The first waveguide wall is positioned so that it covers the first side of the waveguide dielectric, and the second waveguide wall is positioned so that it covers the second side of the waveguide dielectric. In operation, electrical power can be supplied to one or both longitudinal ends of the waveguide dielectric, whereby the power can be coupled to a plasma through the exposed sides of the waveguide dielectric.
申请公布号 US2013126331(A1) 申请公布日期 2013.05.23
申请号 US201213360652 申请日期 2012.01.27
申请人 KUDELA JOZEF;TANAKA TSUTOMU;SORENSEN CARL A.;ANWAR SUHAIL;WHITE JOHN M. 发明人 KUDELA JOZEF;TANAKA TSUTOMU;SORENSEN CARL A.;ANWAR SUHAIL;WHITE JOHN M.
分类号 H01P3/16;H01L21/02;H05H1/46 主分类号 H01P3/16
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