APPARATUS AND METHOD FOR THE TREATMENT OF FLAT SUBSTRATES

摘要

PURPOSE: An apparatus and a method for processing a flat substrate are provided to secure uniform distribution by homogeneously mixing a process medium. CONSTITUTION: A liquid process medium(10) is filled in a dipping bath(6). The liquid process medium is filled to a liquid level. A transfer device(16) dips at least one process surface of the substrate into the liquid process medium. A suction device(34) inhales the liquid process medium from the dipping bath. A discharge device again exhausts the inhaled liquid process medium to the dipping bath.