发明名称 MAGNETO-RESISTANCE EFFECT ELEMENT, AND METHOD FOR MANUFACTURING THE SAME
摘要 A magneto-resistance effect element, including: a fixed magnetization layer of which a magnetization is substantially fixed in one direction; a free magnetization layer of which a magnetization is rotated in accordance with an external magnetic field and which is formed opposite to the fixed magnetization layer; a spacer layer including a current confining layer with an insulating layer and a conductor to pass a current through the insulating layer in a thickness direction thereof and which is located between the fixed magnetization layer and the free magnetization layer; a thin film layer which is located in a side opposite to the spacer layer relative to the free magnetization layer; and a functional layer containing at least one element selected from the group consisting of Si, Mg, B, Al which is formed in or on at least one of the fixed magnetization layer, the free magnetization layer and the thin film layer.
申请公布号 US2013128391(A1) 申请公布日期 2013.05.23
申请号 US201313740983 申请日期 2013.01.14
申请人 KABUSHIKI KAISHA TOSHIBA;TDK CORPORATION;TDK CORPORATION;KABUSHIKI KAISHA TOSHIBA 发明人 FUJI YOSHIHIKO;FUKUZAWA HIDEAKI;YUASA HIROMI;ZHANG KUNLIANG;LI MIN;HARA MICHIKO;KUROSAKI YOSHINARI
分类号 G11B5/39 主分类号 G11B5/39
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