发明名称 COMPOSITION FOR IMPRINT AND INORGANIC THIN FILM FORMED BY USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition for imprint that forms a shaped inorganic thin film and a patterned inorganic thin film, and excels in the transferability of unevenness, and in which the crumble of the unevenness (pattern) by firing can be controlled. <P>SOLUTION: The composition for imprint forms an inorganic thin film by using the mold made of a resin formed by a silicone rubber, includes: a metal oxide particle; and a resin, wherein the content of the metal oxide particle is 10 mass%-99 mass% in a nonvolatile substance, and the content of the resin is 0.05 mass%-10 mass% in the nonvolatile substance. The resin includes a fluorine-containing resin. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013100210(A) 申请公布日期 2013.05.23
申请号 JP20110245932 申请日期 2011.11.09
申请人 NIPPON SHOKUBAI CO LTD 发明人 MAKINO TOMOMI;HATTORI TAKANORI;TAJIRI KOZO
分类号 C01G23/047;C23C26/00 主分类号 C01G23/047
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