发明名称 HIGH INTENSITY X-RAY BEAM SYSTEM
摘要 <p>An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.</p>
申请公布号 EP2304739(B1) 申请公布日期 2013.05.22
申请号 EP20090767279 申请日期 2009.05.27
申请人 RIGAKU INNOVATIVE TECHNOLOGIES INC. 发明人 JIANG, LICAI
分类号 G21K1/06 主分类号 G21K1/06
代理机构 代理人
主权项
地址