<p>A rotary sputtering target bonded to a backing tube such that the bonding material is applied only proximate the ends of the rotary sputtering target and is also between the target and the backing tube to form a gap between the rotary sputtering target and the backing tube and a device for bonding a rotary sputtering target to a backing tube.</p>
申请公布号
EP2593578(A2)
申请公布日期
2013.05.22
申请号
EP20110807344
申请日期
2011.07.11
申请人
MATERION ADVANCED MATERIALS TECHNOLOGIES AND SERVICES INC.