发明名称 WIRING STRUCTURE AND DISPLAY APPARATUS HAVING WIRING STRUCTURE
摘要 <p>A novel interconnection structure which is excellent in adhesion and is capable of realizing low resistance and low contact resistance is provided. An interconnection structure including an interconnection film and a semiconductor layer of a thin film transistor above a substrate in this order from the side of a substrate, wherein the semiconductor layer is composed of an oxide semiconductor, is provided.</p>
申请公布号 KR20130052654(A) 申请公布日期 2013.05.22
申请号 KR20137009988 申请日期 2010.07.27
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO 发明人 GOTO HIROSHI;MAEDA TAKEAKI;IWANARI YUMI;HIRANO TAKAYUKI
分类号 H01L29/786;G02F1/1343;G02F1/1368;H01L21/28 主分类号 H01L29/786
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