METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE

摘要

PURPOSE: A method for fabricating a thin film transistor substrate is provided to prevent the damage of the thin film pattern in the edge of a semitransparent region and a corresponding region. CONSTITUTION: A first conductive pattern(101) is formed. A second conductive pattern is formed. A protection layer and a pixel electrode are formed. A photoresist pattern(168) has a first height in a region corresponding to the edge of a common and, has a second height in a region corresponding to the other region of the common region, and has a third height in a region corresponding to a gate line and the common line.