发明名称 Semiconductor device and method of manufacturing the same
摘要 In one embodiment, a method of manufacturing a semiconductor device is disclosed. The method includes forming a cured film of an insulation resin on a surface of a first semiconductor chip and flip-chip bonding a second semiconductor via a bump on the first semiconductor chip on which the cured film of the insulation resin is formed. The insulation resin can be cured at temperature range from (A-50)° C. to (A+50)° C., wherein "A" is a solidification point of the bump.
申请公布号 US8445321(B2) 申请公布日期 2013.05.21
申请号 US20100887772 申请日期 2010.09.22
申请人 FUKUDA MASATOSHI;KABUSHIKI KAISHA TOSHIBA 发明人 FUKUDA MASATOSHI
分类号 H01L21/44;H01L21/48;H01L21/50 主分类号 H01L21/44
代理机构 代理人
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