发明名称 |
Methods of fabricating semiconductor devices including semiconductor layers formed in stacked insulating layers |
摘要 |
Methods of fabricating a semiconductor device include alternatingly and repeatedly stacking sacrificial layers and first insulating layers on a substrate, forming an opening penetrating the sacrificial layers and the first insulating layers, and forming a spacer on a sidewall of the opening, wherein a bottom surface of the opening is free of the spacer. A semiconductor layer is formed in the opening. Related devices are also disclosed.
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申请公布号 |
US8445343(B2) |
申请公布日期 |
2013.05.21 |
申请号 |
US201113030729 |
申请日期 |
2011.02.18 |
申请人 |
KIM JUNG HO;HWANG KIHYUN;YANG SANGRYOL;SANG YONG-HOON;KIM JU-EUN;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM JUNG HO;HWANG KIHYUN;YANG SANGRYOL;SANG YONG-HOON;KIM JU-EUN |
分类号 |
H01L21/8242;H01L21/8244 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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