发明名称 High-performance gate oxides such as for graphene field-effect transistors or carbon nanotubes
摘要 An apparatus or method can include forming a graphene layer including a working surface, forming a polyvinyl alcohol (PVA) layer upon the working surface of the graphene layer, and forming a dielectric layer upon the PVA layer. In an example, the PVA layer can be activated and the dielectric layer can be deposited on an activated portion of the PVA layer. In an example, an electronic device can include such apparatus, such as included as a portion of graphene field-effect transistor (GFET), or one or more other devices.
申请公布号 US8445893(B2) 申请公布日期 2013.05.21
申请号 US20100839095 申请日期 2010.07.19
申请人 MERIC INANC;SHEPARD KENNETH;TREMBLAY NOAH J.;KIM PHILIP;NUCKOLLS COLIN P.;TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK 发明人 MERIC INANC;SHEPARD KENNETH;TREMBLAY NOAH J.;KIM PHILIP;NUCKOLLS COLIN P.
分类号 H01L29/08 主分类号 H01L29/08
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