| 发明名称 |
Composition for radical polymerization and method of forming pattern using the composition |
| 摘要 |
A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.
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| 申请公布号 |
US8445178(B2) |
申请公布日期 |
2013.05.21 |
| 申请号 |
US20090479151 |
申请日期 |
2009.06.05 |
| 申请人 |
PARK JONG-JIN;LEE KWANG-HEE;BULLIARD XAVIER;CHOI YUN-HYUK;LEE KWANG-SUP;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JONG-JIN;LEE KWANG-HEE;BULLIARD XAVIER;CHOI YUN-HYUK;LEE KWANG-SUP |
| 分类号 |
G03F7/00;G03F7/004;G03F7/027;G03F7/40 |
主分类号 |
G03F7/00 |
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