| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint device advantageous to improve overlay accuracy during imprint processing. <P>SOLUTION: The imprint device molds and cures uncured resin on a base plate by a mold to form a pattern of the cured resin on the base plate. The imprint device includes: a mold deformation mechanism for giving external force or displacement to the mold to correct the shape of a pattern part formed in the mold; a base plate deformation mechanism for forming a temperature distribution in a base plate side pattern preliminarily existing in a pattern formation area on the base plate on which a pattern should be formed, and correcting the shape of the base plate side pattern; and a control part for executing control for matching the shape of the pattern part with the shape of the base plate side pattern by making the mold deformation mechanism correct the shape of the pattern part (S109) while pressing resin applied onto the base plate side pattern and the pattern part (S108) after making the base plate deformation mechanism correct the shape of the base plate side pattern (S106). <P>COPYRIGHT: (C)2013,JPO&INPIT |
