ETCHING COMPOSITION, METHOD OF FORMING A METAL PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE

摘要

PURPOSE: An etching composition is provided to improve storage stability and process margin and to form a metal pattern with a stable taper-shaped profile. CONSTITUTION: An etching composition of a copper-based metal film comprises 0.1-30 wt% of ammonium peroxodisulfate, 0.1-10 wt% of a sulphate, 0.01-5 wt% of an acetic acid salt, and 55-99.79 wt% of water. A forming method of a meal patter comprises a step of forming a copper-manganese alloy layer(126) on a substrate(110); a step of forming a photoresist pattern(130) on the alloy layer; a step of patterning the alloy layer with the etching composition using the photoresist pattern as an etching-preventing film.