发明名称 METHOD FOR MANUFACTURING MASK
摘要 <P>PROBLEM TO BE SOLVED: To facilitate formation of a plurality of highly fine aperture patterns and maintain the shape and position of the aperture patterns even during handling. <P>SOLUTION: A holding member 1 is formed by providing a plurality of penetrating openings 6 of a shape larger than a thin film pattern to a plate magnetic metal material. A resin film 2 that transmits visible light is firmly attached to one surface of the holding member 1 and held. After the holding member 1 is positioned for a substrate 3 placed on the first magnetic chuck 17, the holding member 1 is absorbed with magnetic force and the film 2 is firmly attached to the surface of the substrate 3. A laser beam is radiated to the film 2 part in the opening 6 of the holding member 1, and the penetrating aperture pattern 4 of the same shape as the thin film pattern is formed. The holding member 1 is absorbed by magnetic force of the second magnetic chuck 18, and the holding member 1 and the film 2 are integrally peeled from the substrate 3. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013095993(A) 申请公布日期 2013.05.20
申请号 JP20110242090 申请日期 2011.11.04
申请人 V TECHNOLOGY CO LTD 发明人 KUDO SHUJI;MIZUMURA MICHINOBU;KAJIYAMA KOICHI
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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