| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic system in which one or more problems introduced by deviation of the wavelength of one or more of radiation beams from a nominal value can be mitigated or minimized, for example. <P>SOLUTION: The lithographic apparatus has a projection system to project a plurality of radiation beams onto a substrate. The plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel. <P>COPYRIGHT: (C)2013,JPO&INPIT |
