| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition, which allows formation of a pattern with high resolution in a good profile and has little influences of PEB temperature on a pattern dimension, and to provide a method for forming a resist pattern using the resist composition. <P>SOLUTION: The resist composition contains a base component (A) that generates an acid by exposure and shows changes in the solubility with a developing solution by an action of an acid. The base component (A) contains a copolymer (A1), which has a structural unit (a0) containing a group expressed by general formula (a0-1) or (a0-2), a structural unit (a11) containing an acid decomposable group that shows increase in the polarity by an action of an acid and contains a polycyclic group, and a structural unit (a12) containing an acid decomposable group that shows increase in the polarity by an action of an acid and contains a monocyclic group. In the formulae, -R<SP POS="POST">3</SP>-S<SP POS="POST">+</SP>(R<SP POS="POST">4</SP>)(R<SP POS="POST">5</SP>) and M<SP POS="POST">m+</SP>each include only one aromatic ring as a whole or no aromatic ring. <P>COPYRIGHT: (C)2013,JPO&INPIT |
