发明名称 |
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER READABLE STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM |
摘要 |
<P>PROBLEM TO BE SOLVED: To quickly and smoothly drop droplets from a substrate during dry processing of the substrate thereby improving the throughput of a substrate processing apparatus and drying the substrate well. <P>SOLUTION: A substrate processing apparatus (1) of the invention is provided with: a liquid processing tank (7) where liquid processing of a substrate (6) is performed with a process liquid; a dry processing tank (22) provided above the liquid processing tank (7) and where the dry processing of the substrate (6) is performed; a shield door (33) provided between the liquid processing tank (7) and the dry processing tank (22) and shielding the liquid processing tank (7) from the dry processing tank (22); substrate transfer means (5) transferring the substrate (6) between the liquid processing tank (7) and the dry processing tank (22); and a droplet removal member (46) provided so as to relatively contact with or separate from an outer peripheral edge part of the substrate (6) for removing droplets from the substrate (6) that is subject to the liquid processing. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013098304(A) |
申请公布日期 |
2013.05.20 |
申请号 |
JP20110238874 |
申请日期 |
2011.10.31 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
SHIOKAWA TOSHIYUKI;NOMURA TAKESHI |
分类号 |
H01L21/304;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|