LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To improve or facilitate thermal conditioning of wafers prior to exposure in a lithographic apparatus.

SOLUTION: A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system configured for transferring the thermally conditioned substrate to the substrate table. The substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during the transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.

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