| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately correcting the position of a mask when the position of the mask is deviated in a direction orthogonal to a moving direction of an exposure object base material during exposure due to a secular change or the like of the exposure device. <P>SOLUTION: A reference plate 4 is disposed to interpose between a light source and a mask 3. The reference plate 4 is provided with a first reference mark 41 showing a reference of a position where the mask 3 is to be disposed for every mask 3. A first reference mark 41 and a mask alignment mark (slit 32) are detected by a camera 51. A control section 7 detects a deviation of the mask 3 in a direction orthogonal to a film moving direction on the basis of a distance a between both the detected marks 41 and 32 and corrects the position of the mask 3 by a drive section 6. <P>COPYRIGHT: (C)2013,JPO&INPIT |
