发明名称 |
ULTRAVIOLET IRRADIATION APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ultraviolet irradiation apparatus capable of enlarging the area of an irradiation area by suppressing a fall in ultraviolet illuminance in an end region of a substrate processing part. <P>SOLUTION: The ultraviolet irradiation apparatus includes a substrate treating section 1 on which a substrate A to be treated with ultraviolet rays is arranged, and an ultraviolet irradiation section 2 having a plurality of ultraviolet irradiation units 21 arranged in grated shape to face the substrate treating section 1. The ultraviolet irradiation section 2 includes first ultraviolet irradiation units 21A, and second ultraviolet irradiation units 21B high in the peak value P of ultraviolet illuminance in the position of the substrate treating section 1 and narrow in irradiation area S of irradiating at least the 50% value of the peak value P in comparison with the first ultraviolet irradiation units 21A. The first ultraviolet irradiation units 21A are arranged in a center region in at least partial rows or columns in the array of the ultraviolet irradiation section 2, and the second ultraviolet irradiation units 21B are arranged in the end region. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013094737(A) |
申请公布日期 |
2013.05.20 |
申请号 |
JP20110240235 |
申请日期 |
2011.11.01 |
申请人 |
HARISON TOSHIBA LIGHTING CORP |
发明人 |
FUJITA MASAHIRO;TANAKA TAKAAKI;MAEDA SHOHEI;MORI SHINYA |
分类号 |
B01J19/12;H01J65/04;H01L21/027 |
主分类号 |
B01J19/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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