DEPOSITION APPARATUS AND DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a deposition apparatus and a deposition method, which can uniform a temperature distribution in a circumferential direction of a substrate.

SOLUTION: A deposition apparatus 100 comprises: a chamber 1 to which a reaction gas 4 is supplied and in which a deposition process is performed; a susceptor 8 arranged in the camber 1 and on which a substrate 7 is placed; and a heater 9 for heating the susceptor 8 from under. The susceptor 8 has a ring-shaped first susceptor part 8a and a second susceptor part 8b provided in contact with the first susceptor part 8a and shielding an opening of the first susceptor 8a. A surface of the second susceptor part 8b which faces a heating part slants from a horizontal plane. The first susceptor part 8a has different shapes in a circumferential direction corresponding to thicknesses of the second susceptor part 8b.

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